Display Dry Etching
Dry etching removes and etches a masked pattern of semiconductor material through an ion bombardment (usually a plasma of reactive gases) to dislodge material from the exposed surfaces. This process can result in condensation and high levels of by-products, which may affect vacuum valve functionality and reliability.
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The volume manufacturing of multilayer stacks with dry etching processes requires self-cleaning function and an overall robust tool design for high uptime. PRECESS vacuum valve solutions provide innovative functionality to ensure increased process safety and enhanced tool uptime.

To find more how PRECESS vacuum valve solution can solve dry etching process issues, please select from the products listed below.

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