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Sputtering
PVD sputtering is a core process in display production. An important manufacturing step is, for example, backplane metallization, in which conductive tracks for thin-film transistors are deposited. As thin-film transistors (TFTs) get smaller and substrates get larger, the impact of controlled process conditions becomes increasingly important for consistently high manufacturing quality. PRECESS high-performance vacuum valves have a decisive influence on this.
Home > Product Applications > Display Production > Sputtering

PVD sputtering to produce faster and smaller transistors for high-resolution displays requires high deposition uniformity over large substrate areas. Control of vacuum conditions is critical in this process. PRECESS vacuum valve solutions offer highly precise control capabilities even at very low conductance levels and reliable high-frequency isolation while maximizing particle activation avoidance.

To find more how PRECESS vacuum valve solution can solve sputter application challenges, please select from the products listed below.

RELEVANT SERIES
Series V70 L-Motion Four Opening Transfer Valve
For EFEM and TM Isolation
V701 × 10-9 mbar to 1.2 bar (abs)