The PRECESS vacuum valve is designed for thin film deposition processes for precise, stable operation even under changing process conditions. Key features include precise gas flow control even at low conductance levels, minimized residual gas and particulate emissions, and a modular design that allows the required vacuum valves to be optimally configured to meet specific process requirements.
To find more how PRECESS vacuum valve solution can solve a range of thin film deposition issues, please select from the products listed below.