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Ion Implanting
Used to alter the electrical properties of a silicon substrates, ion implantation is a low-temperature process that accelerates ions into the target. The success of ion implantation processes is heavily dependent on the quality of the vacuum within ion implanters – and the vacuum valves that control and isolate the high vacuum environment.
Home > Product Applications > Display Production > Ion Implanting

For optimal isolation and control of vacuum conditions in ion implanters, vacuum valves are needed that allow precise control while exhibiting physically neutral behavior in the process.

To find more how PRECESS vacuum valve solution can help to solve ion implantation process issues, please select from the products listed below.

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